Split-gate dram with mugfet, design structure, and method of manufacture

ABSTRACT

A method of manufacturing a dynamic random access memory cell includes: forming a substrate having an insulating region over a conductive region; forming a fin of a fin-type field effect transistor (FinFET) device over the insulating region; forming a storage capacitor at a first end of the fin; and forming a back-gate at a lateral side of the fin. The back-gate is in electrical contact with the conductive region and is structured and arranged to influence a threshold voltage of the fin.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is related to U.S. Ser. No. ______ and Attorney DocketNumber BUR920080078US2 filed on the same day and currently pending.

FIELD OF THE INVENTION

The invention relates to semiconductor devices used for memoryapplications, and more particularly, to a design structure, structure,and method for providing a split-gate DRAM with MuGFET.

BACKGROUND

DRAM (Dynamic Random Access Memory) is desirable over SRAM (StaticRandom Access Memory) in many situations because DRAM arrays can bedenser and DRAM devices require less power to operate. As semiconductordevice sizes continue to decrease (for example, toward the 22 nanometernode, and smaller), single gate devices begin to experience performancedegradation, such as short channel effects. Accordingly, there is atrend toward using multiple gate field effect transistor devices (e.g.,MuGFET). Some conventional DRAM devices employ a planar transistor witha gate beneath the channel and a word line above the channel. However,these arrangements exhibit relatively low performance and can only bearranged in low-density arrays.

A challenge facing DRAM improvement is the reduction of operating powereven lower than what it is currently employed. This is at least partlydue to the phenomenon of leakage. For example, when threshold voltage ofa fin-type field effect transistor (FinFET) DRAM device is reduced toofar, leakage becomes a significant concern. The threshold voltage ofFinFET retards leakage of stored charge out of the capacitance structureof the DRAM. Leakage increases as threshold voltage decreases, therebyrequiring more frequent updating of the capacitance structure of theDRAM.

However, it is desirable in some circumstances to have a low thresholdvoltage, because a lower threshold voltage permits a lower wordlinevoltage to be utilized with the DRAM device. Put another way, when thethreshold voltage is kept high to prevent undesirable leakage, thewordline voltage during write and read operations must also be high toovercome the threshold voltage. Since the wordline voltage is directlyrelated to the operating power required to drive a DRAM device, leakageis generally in conflict with lowering the operating power.

Accordingly, there exists a need in the art to overcome the deficienciesand limitations described hereinabove.

SUMMARY

In a first aspect of the invention, there is a method of manufacturing adynamic random access memory cell. The method comprises: forming asubstrate having an insulating region over a conductive region; forminga fin of a fin-type field effect transistor (FinFET) device over theinsulating region; forming a storage capacitor at a first end of thefin; and forming a back-gate at a lateral side of the fin. The back-gateis in electrical contact with the conductive region and is structuredand arranged to influence a threshold voltage of the fin.

In a second aspect of the invention, there is a method of manufacturinga dynamic random access memory cell, the method comprising: forming adoped region within a substrate; forming a conductive layer over thedoped region; forming an insulating layer over the conductive layer; andforming a fin over the insulating region. The method further includes:forming a storage capacitor connected to a first end of the fin; forminga bit line contact connected to a second end of the fin opposite thefirst end; forming a back-gate at a first lateral side of the finbetween the first end and the second end, wherein the back-gate is inelectrical contact with the conductive layer; and forming a front gateat a second lateral side of the fin opposite the first lateral side.

In a third aspect of the invention, there is a method of forming anarray of dynamic random access memory cells, the method comprisingforming a plurality of fins over a conductive region of a substrate. Foreach one of the plurality of fins, the method includes forming: astorage capacitor connected to a first longitudinal end of the fin; aback-gate adjacent at a first lateral side of the fin, wherein theback-gate is in electrical contact with the conductive region; and afront gate at a second lateral side of the fin opposite the firstlateral side.

In a fourth aspect of the invention, there is a method of forming anarray of dynamic random access memory cells. The method comprises:forming, in a substrate, a doped region having a first type of dopant;forming, in the substrate and over the doped region, a conductive regionhaving a second type of dopant opposite the first type of dopant; andforming a plurality of fin-type field effect transistor (FinFET)devices. Each one of the plurality of FinFET devices comprises: a finformed over the conductive region of a substrate; a storage capacitorconnected to a longitudinal end of the fin; a back-gate adjacent at afirst lateral side of the fin, wherein the back-gate is in electricalcontact with the conductive region; and a front gate at a second lateralside of the fin opposite the first lateral side.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

The present invention is described in the detailed description whichfollows, in reference to the noted plurality of drawings by way ofnon-limiting examples of exemplary embodiments of the present invention.

FIG. 1 shows a cross-sectional plan view of portions of an interleavedarray of DRAM devices according to aspects of the invention;

FIG. 2 shows a cross-sectional view taken along line A-A of FIG. 1.

FIGS. 3-29 show fabrication processes and respective structures formanufacturing a structure in accordance with aspects of the invention;

FIG. 30 shows a cross-sectional view of another configuration of a DRAMdevice according to aspects of the invention;

FIGS. 31-38 show fabrication processes and respective structures formanufacturing a structure in accordance with aspects of the invention;

FIG. 39 shows a cross-sectional plan view of portions of anotherarrangement of an interleaved array of DRAM devices according to aspectsof the invention; and

FIG. 40 is a flow diagram of a design process used in semiconductordesign, manufacture, and/or test.

DETAILED DESCRIPTION

The invention relates to semiconductor devices used for memoryapplications, and more particularly, to a design structure, structure,and method for providing a split-gate DRAM with MuGFET. In embodimentsof the invention, a DRAM device comprises a FinFET having a wordline ona first lateral side of a vertical fin and a back-gate on an oppositelateral side of the fin. According to aspects of the invention, theback-gate is connected at its base to a conducting layer of thesubstrate, thereby placing the back-gate at substantially the sameelectrical potential as the conducting layer. In this manner, thethreshold voltage of the fin may be controlled by controlling theelectrical potential of the conducting layer. Moreover, multipleback-gates of multiple DRAM devices in an array may be connected to thesame conducting layer, thereby providing simultaneous control of thearray of DRAM devices.

In embodiments of the invention, the DRAM device operates in at leasttwo modes. In a first mode (e.g., standby mode), the back-gate is biasedrelatively negative (e.g., to about −1.0 v), which results in a highthreshold voltage in the fin, which reduces subthreshold channelleakage. The bias of the back-gate is provided via the conducting layerof the substrate. In a second mode of operation (e.g., read/write mode,also referred to as access mode), the back-gate is biased to arelatively positive level (e.g., about 0 to +1.0 v), which lowers thethreshold voltage in the fin, which reduces the amount of voltagerequired on the wordline to read from or write to the storage structure(e.g., capacitor) of the DRAM, and hence reduces the required power fora read or a write operation.

In this manner, embodiments of the invention include a DRAM device thatoperates at relatively low power while reducing the effect of leakage.Moreover, by using a vertical fin and split gates with the back-gateelectrically connected to a conducting layer of the substrate,implementations of the invention provide this low-power DRAM device indense arrays.

FIG. 1 shows a cross-sectional plan view of portions of an interleavedarray of DRAM devices according to aspects of the invention. Eachrespective device 50 a-d is a FinFET device comprising a fin 55, storagecapacitor 60, and bit line contact 65. In embodiments, back-gates 70 andword lines 75 are arranged laterally to the sides of the fins 55. Inembodiments, the array is interleaved such that the storage capacitor 60of one device (e.g., 50 a) is in the place of the bit line contact 65 ofan adjacent device (e.g., 50 b), and vice versa.

FIG. 2 shows a cross-sectional view taken along line A-A of FIG. 1. Asseen in FIG. 2, the back-gate 70 extends downward from one lateral sideof the fin 55. At its base, the back-gate 70 is in contact with aconductive layer 80, which is formed on a top surface of a doped region85 that is formed within the substrate (not shown). In embodiments, theconductive layer 80 is a P+type layer, the doped region 85 is an N−typeregion, and the substrate is a P−type silicon material substrate.Alternatively, the conductive layer 80 may be an N+layer, the dopedregion 85 may be a P−type region, and the substrate may be an N−typesilicon material substrate. As further depicted in FIG. 2, the bit linecontact 65 extends upward from the fin 55, and the capacitor 60 extendsdownward from the fin 55 into the conductive layer 80 and the dopedregion 85.

According to aspects of the invention, by connecting the back-gate 70 tothe conducting layer 80, the electrical bias in the fin 55 may becontrolled by selectively manipulating the electrical potential of theconducting layer 80. Moreover, by connecting the respective back-gates70 of plural devices (e.g., 50 a-d) to the same conducting layer 80, theplural devices (e.g., 50 a-d) can be biased between standby mode andread/write mode as a group. The interface between the conducting layer80 and the doped region 85 ensures that there is little or noconductivity between the conducting layer 80 and the doped region 85.This allows the conducting layer 80 to be utilized as a wiring layer forany back-gate 70 connected to the conducting layer 80.

FIGS. 3-29 show fabrication processes and respective structures formanufacturing a structure in accordance with the present invention. FIG.3 shows a beginning structure for forming devices according to aspectsof the invention. As depicted in FIG. 3, the conducting layer 80 isformed on a top surface of the doped region 85. The doped region 85 may,in turn, be formed as a doped region within a substrate. In embodiments,the conducting layer 80 is a P−type region that is formed by ionimplantation to a concentration of about 1×10¹⁸ atoms/cm³ to about1×10²¹ atoms/cm³, although the invention is not limited to theseconcentrations and other concentrations may be used.

Formed on a top surface of the conducting layer 80 is an insulator 90,such as a buried oxide (BOX). Formed on a top surface of the BOX 90 isan active silicon region 95. Formed on a top surface of the activesilicon 95 are pad films 100, which may comprise, for example, an SiO₂layer formed on the active silicon 95 and an Si₃N₄ layer formed on theSiO₂ layer. All of the layers described thus far (e.g., 80, 85, 90, 95,100) may be formed using conventional semiconductor processingtechniques.

FIG. 4 shows the structure of FIG. 3 after a number of intermediateprocessing steps, and corresponds to a cross section along line B-B ofFIG. 1. As depicted in FIG. 4, capacitors 60 have been formed in thelayers 80, 85, 90, and 95. A trench capacitor dielectric 105 surrounds atrench conductor 110 in each capacitor 60. The trench capacitordielectric 105 may be composed of, for example, an oxynitride, high-kdielectric, etc. In embodiments, when the trench capacitor dielectric105 is an oxynitride, the trench conductor 110 may be formed of dopedpolysilicon. Alternatively, when the trench capacitor dielectric 105 isa high-k dielectric, the trench conductor 110 may be formed of atitanium nitride liner surrounding aluminum or doped polysilicon.However, the invention is not limited to these materials, and anysuitable materials may be used for the trench capacitor dielectric 105and the trench conductor 110.

The intermediate process steps for forming the structure of FIG. 4 mayinclude, for example: forming a trench in the pad films 100 (e.g., usingconventional patterning and etching, such as photolithography andreactive ion etching (RIE)), forming a corresponding trench in thelayers 80, 85, 90, and 95 (e.g., using RIE); depositing the trenchcapacitor dielectric 105 (e.g., using chemical vapor deposition (CVD),atomic layer deposition (ALD), etc.); form filling the trench the trenchconductor 110; planarizing the top surface of the structure (e.g., usingchemical mechanical polish (CMO); etching the trench conductor 110 downto a level within the BOX layer 95 (e.g., below the active silicon 95);etching back the pad films away from the trench; removing any trenchdielectric exposed by the etching of the trench conductor 110 (e.g.,using wet etch, isotropic etch, etc.); growing, optionally selectively,silicon to fill in open portions of the trench between the trenchconductor 110 and the active silicon 95; and stripping the remaining padfilms 100 (e.g., using selective RIE, then a wet or dry etch).

FIGS. 5 and 6 show intermediate structures shown along lines B-B and C-Cof FIG. 1, respectively, during concurrent process steps according toaspects of the invention. For example, FIG. 5 shows the cross sectionalong line B-B, which represents the region where the capacitors 60 andbit line contacts 65 are formed. FIG. 6 shows the cross section alongline C-C, which represents the region where the gates (e.g., theback-gate 70 and word line 75) are formed.

As depicted in FIGS. 5 and 6, a second pad film 115 is formed on a topsurface of the active silicon 95, and a mandrel 120 is formed on a topsurface of the second pad film 115. The second pad film 115 and mandrel120 may be any suitable materials, and may be formed using conventionaldeposition techniques. The pad film may comprise, for example, oxide,nitride, or a combination of the both. The mandrel may be composed of,but is not limited to, silicon dioxide, or a polyimide

FIGS. 7 and 8 show concurrent intermediate structures along lines B-Band C-C of FIG. 1, respectively. As depicted in FIG. 7, portions of thesecond pad film 115 and active silicon 95 are etched to expose the BOX90. Similarly, in FIG. 8, portions of the second pad film 115, theactive silicon 95, and the BOX 90 are etched to expose the conductivelayer 80. The etching may be performed using conventional etchingtechniques, such as photolithographic masking and RIE.

FIGS. 9 and 10 show concurrent intermediate structures along lines B-Band C-C of FIG. 1, respectively. As depicted in FIGS. 9 and 10,back-gate dielectric 125 is formed on all exposed surfaces (e.g., oflayers 90, 95, 115 and 120 in FIG. 9, and layers 80, 90, 95, 115, and120 in FIG. 10). The back-gate dielectric 125 may be composed of anysuitable substance, including, but not limited to, hafnium oxide,hafnium silicate, etc. The back-gate dielectric 125 may be formed byknown techniques (e.g., deposition, thermal oxidation, etc.).

FIGS. 11 and 12 show concurrent intermediate structures along lines B-Band C-C of FIG. 1, respectively. In embodiments, back-gate electrodematerial 130 is conformally deposited and anisotropically etched to formsidewall gates. Then, exposed back-gate dielectric 125 is removed viaetching. In embodiments, the back-gate electrode material 130 comprises,but it not limited to, a titanium nitride and tungsten composite.

FIGS. 13 and 14 show concurrent intermediate structures along lines B-Band C-C of FIG. 1, respectively. In embodiments, more of the sameback-gate electrode material 130 described above with respect to FIGS.11 and 12 is added to fill recesses adjacent the sidewall gates. Then,an insulator 135 (e.g., SiO₂) is formed above the sidewall gatesadjacent the mandrels 120. Surfaces may be planarized between steps.

As depicted in FIGS. 15 and 16, which show concurrent intermediatestructures along lines B-B and C-C of FIG. 1, respectively, the mandrelis removed to expose portions of the second pad film 115. The mandrelmay be removed using RIE. As depicted in FIGS. 17 and 18, which showconcurrent intermediate structures along lines B-B and C-C of FIG. 1,respectively, spacers 140 are formed on the second pad film 115 andadjacent the insulator 135. The spacers 140 may be nitride, for exampleformed using a nitride deposition followed by a directional etch.

FIGS. 19 and 20 show concurrent intermediate structures along lines B-Band C-C of FIG. 1, respectively. As depicted in FIGS. 19 and 20,portions of the pad film 115 and active silicon 95 are removed to formthe fins 55. For example, a first hard mask etch may be followed by asecond silicon etch that removes any exposed silicon down to the BOXlayer 90. Then, as depicted in FIGS. 21 and 22, which show concurrentintermediate structures along lines B-B and C-C of FIG. 1, respectively,a word-line gate dielectric 145 is formed on all exposed surfaces. Inembodiments, the word-line gate dielectric 145 includes hafnium oxide,hafnium silicate, etc., although any suitable material may be used.

Subsequently, as depicted in FIGS. 23 and 24, which show concurrentintermediate structures along lines B-B and C-C of FIG. 1, respectively,a word-line gate electrode material 150 is formed on all exposedsurfaces. In embodiments, the word-line gate electrode material 150 iscomposed of any suitable conductor, including, but not limited to:titanium nitride, tungsten, doped polysilicon, etc.

FIGS. 25 and 26 show concurrent intermediate structures along lines B-Band C-C of FIG. 1, respectively. As depicted in FIG. 25, the word-linegate electrode, word line gate dielectric, spacers, insulator, back-gateelectrode material, and back-gate dielectric are removed in the regionof the capacitors and bit line contacts. The removal of this materialmay be performed using conventional techniques, such as patterning andetching, and results in interleaved contacts 155 for the capacitor 60and the bit line contact (not yet formed). The patterning, as depictedin FIG. 26, results in formation of the word line 75 and back-gate 70 oneither side of each fin 55. After the patterning, the portions of thefins 55 that will serve as the source and drain for each respectiveFinFET device may be doped using conventional techniques, such asmasking and ion-implantation of suitable ions.

FIGS. 27 and 28 show concurrent intermediate structures along lines B-Band C-C of FIG. 1, respectively. In embodiments, a layer of dielectricmaterial 160 (e.g., SiO₂) is formed over all exposed surfaces of thestructure. Then, a first patterned etch is performed to produce trenches165 around the contacts 155 for the bit line contacts, and a second etchis performed to remove the cap (e.g., second pad film 115) from the topof the contacts 155 inside the trenches 165.

As shown in FIG. 29, which depicts an intermediate structure along lineB-B of FIG. 1, the trenches are filled with a conductor 170, such as,for example, doped polysilicon, copper, tungsten, etc. The result is astructure having interleaved bit line contacts 65 and capacitors 60,each associated with a respective fin 55. At this point, conventionalback end of line (BEOL) processing techniques may be used to finish thearray. For example, conventional interconnect processes may be used toproviding wiring that completes the array. Although an array having fourdevices has been described thusfar, the invention is not limited to thisnumber of devices, and any suitable number of devices can be used in anarray in accordance with aspects of the invention.

FIG. 30 shows an alternative configuration similar to the structureshown in FIG. 2, except that in FIG. 30 the capacitor 60 extends upwardfrom the fin 55. The structure depicted in FIG. 30 includes a back-gate70 in contact with a conductive layer 80 formed on a top surface of adoped region 85 of a substrate, and can be used in an interleaved array,such as that shown in FIG. 1. The structure in FIG. 30 also includes aword line 75 for reading from and/or writing to the capacitor 60. Thestructure of FIG. 30 may be employed in an interleaved array, such asthat shown in FIG. 1, as described in greater detail herein.

FIGS. 31-38 show fabrication processes and respective structures formanufacturing a structure in accordance with the present invention.Particularly, FIGS. 31 and 32 show concurrent intermediate structuresalong lines B-B and C-C of FIG. 1, respectively, based upon thestructure depicted in FIG. 30. The structures shown in FIGS. 31 and 32may be arrived at using the same processing steps as described abovewith respect to FIGS. 3-26, excluding the formation of the capacitorsdescribed with respect to FIG. 4. Accordingly, FIG. 31 shows a number ofcontacts 155 formed on a top surface of the BOX layer 90, for example,at the line B-B of FIG. 1. Each contact 155 comprises a portion of a fin55 and a cap composed of second pad film 115. Similarly, FIG. 32 depictsthe gate region along line C-C of FIG. 1, and shows fins 55 thatcorrespond to the fins 55 described above with respect to FIG. 31. Alsoshown in FIG. 32 are back-gates 70 and word lines 75.

As depicted in FIG. 33, a layer of dielectric material 160 is formed onthe exposed surfaces, including the BOX layer 90. Trenches are formed inthe dielectric material 160 and filled with a conductor 170. Inembodiments, the dielectric material 160 comprises SiO₂, and theconductor 170 comprises doped polysilicon, copper, tungsten, etc.However, the invention is not limited to these materials, and anysuitable materials may be used.

As depicted in FIG. 34, a second layer of dielectric material 175 isdeposited on all exposed surfaces (e.g., the dielectric material andconductor 170). The second layer of dielectric material 175 may compriseany suitable material, such as, for example, SiO₂. Trenches 180, whichwill hold the storage capacitors (not yet formed), are created in thesecond layer of dielectric material 175, using, for example,conventional patterning and etching techniques.

As depicted in FIG. 35, a conductive liner 185 is conformally depositedon the exposed surfaces of the second layer of dielectric material 175,including inside the trenches 180. The conductive liner 185 may becomposed of, but is not limited to, titanium nitride, tantalum nitride,etc. Subsequently, a storage dielectric material 190 is deposited on theconductive liner 185. In embodiments, the storage dielectric material190 is composed of high-k dielectric, such as hafnium silicate, althoughother suitable materials may be used.

As depicted in FIG. 36, a trench conductor 195 is deposited on exposedsurfaces. The trench conductor 195 may comprise, but is not limited to,a liner of titanium nitride or tantalum nitride with tungsten or dopedpolysilicon fill. Then, as shown in FIG. 37, the structure isplanarized, e.g., using a CMP process, thereby removing portions of theconductive liner 185, the storage dielectric material 190, and thetrench conductor 195.

FIG. 38 shows a third dielectric layer 200 formed on a top surface ofthe second dielectric layer 175. Trenches 205 are formed through thethird dielectric layer 200, down to the trench conductor 195. Trenches210 are formed through the third dielectric layer 200 and the seconddielectric layer 175, down to the conductor 170. The trenches 205 and210 are filled with any suitable conductor 215, thereby forminginterleaved capacitors 60 and bit line contacts 65. At this point,conventional back end of line (BEOL) processing techniques may be usedto finish the array. For example, conventional interconnect processesmay be used to providing wiring that completes the array. Although anarray having four devices has been described thusfar, the invention isnot limited to this number of devices, and any suitable number ofdevices can be used in an array in accordance with aspects of theinvention.

FIG. 39 shows an alternative configuration of an interleaved array ofDRAM devices according to aspects of the invention. The array includesfins 55, word lines 75, back-gates 70, bit line contacts 65, and storagecapacitors 60, either formed downward from the fin 55 (e.g., as shown inFIG. 2) or formed upward from the fin 55 (e.g., as shown in FIG. 30).Wires 215 connected to the bit line contacts 65 may also be employed.

DESIGN STRUCTURE

FIG. 40 shows a block diagram of an exemplary design flow 900 used forexample, in semiconductor IC logic design, simulation, test, layout, andmanufacture. Design flow 900 includes processes and mechanisms forprocessing design structures or devices to generate logically orotherwise functionally equivalent representations of the designstructures and/or devices described above and shown in FIGS. 1-39. Thedesign structures processed and/or generated by design flow 900 may beencoded on machine-readable transmission or storage media to includedata and/or instructions that when executed or otherwise processed on adata processing system generate a logically, structurally, mechanically,or otherwise functionally equivalent representation of hardwarecomponents, circuits, devices, or systems. Design flow 900 may varydepending on the type of representation being designed. For example, adesign flow 900 for building an application specific IC (ASIC) maydiffer from a design flow 900 for designing a standard component or froma design flow 900 for instantiating the design into a programmablearray, for example a programmable gate array (PGA) or a fieldprogrammable gate array (FPGA) offered by Altera® Inc. or Xilinx® Inc.

FIG. 40 illustrates multiple such design structures including an inputdesign structure 920 that is preferably processed by a design process910. Design structure 920 may be a logical simulation design structuregenerated and processed by design process 910 to produce a logicallyequivalent functional representation of a hardware device. Designstructure 920 may also or alternatively comprise data and/or programinstructions that when processed by design process 910, generate afunctional representation of the physical structure of a hardwaredevice. Whether representing functional and/or structural designfeatures, design structure 920 may be generated using electroniccomputer-aided design (ECAD) such as implemented by a coredeveloper/designer. When encoded on a machine-readable datatransmission, gate array, or storage medium, design structure 920 may beaccessed and processed by one or more hardware and/or software moduleswithin design process 910 to simulate or otherwise functionallyrepresent an electronic component, circuit, electronic or logic module,apparatus, device, or system such as those shown in FIGS. 1-39. As such,design structure 920 may comprise files or other data structuresincluding human and/or machine-readable source code, compiledstructures, and computer-executable code structures that when processedby a design or simulation data processing system, functionally simulateor otherwise represent circuits or other levels of hardware logicdesign. Such data structures may include hardware-description language(HDL) design entities or other data structures conforming to and/orcompatible with lower-level HDL design languages such as Verilog andVHDL, and/or higher level design languages such as C or C++.

Design process 910 preferably employs and incorporates hardware and/orsoftware modules for synthesizing, translating, or otherwise processinga design/simulation functional equivalent of the components, circuits,devices, or logic structures shown in FIGS. 1-39 to generate a netlist980 which may contain design structures such as design structure 920.Netlist 980 may comprise, for example, compiled or otherwise processeddata structures representing a list of wires, discrete components, logicgates, control circuits, I/O devices, models, etc. that describes theconnections to other elements and circuits in an integrated circuitdesign. Netlist 980 may be synthesized using an iterative process inwhich netlist 980 is resynthesized one or more times depending on designspecifications and parameters for the device. As with other designstructure types described herein, netlist 980 may be recorded on amachine-readable data storage medium or programmed into a programmablegate array. The medium may be a non-volatile storage medium such as amagnetic or optical disk drive, a programmable gate array, a compactflash, or other flash memory. Additionally, or in the alternative, themedium may be a system or cache memory, buffer space, or electrically oroptically conductive devices and materials on which data packets may betransmitted and intermediately stored via the Internet, or othernetworking suitable means.

Design process 910 may include hardware and software modules forprocessing a variety of input data structure types including netlist980. Such data structure types may reside, for example, within libraryelements 930 and include a set of commonly used elements, circuits, anddevices, including models, layouts, and symbolic representations, for agiven manufacturing technology (e.g., different technology nodes, 32 nm,45 nm, 90 nm, etc.). The data structure types may further include designspecifications 940, characterization data 950, verification data 960,design rules 970, and test data files 985 which may include input testpatterns, output test results, and other testing information. Designprocess 910 may further include, for example, standard mechanical designprocesses such as stress analysis, thermal analysis, mechanical eventsimulation, process simulation for operations such as casting, molding,and die press forming, etc. One of ordinary skill in the art ofmechanical design can appreciate the extent of possible mechanicaldesign tools and applications used in design process 910 withoutdeviating from the scope and spirit of the invention. Design process 910may also include modules for performing standard circuit designprocesses such as timing analysis, verification, design rule checking,place and route operations, etc.

Design process 910 employs and incorporates logic and physical designtools such as HDL compilers and simulation model build tools to processdesign structure 920 together with some or all of the depictedsupporting data structures along with any additional mechanical designor data (if applicable), to generate a second design structure 990.Design structure 990 resides on a storage medium or programmable gatearray in a data format used for the exchange of data of mechanicaldevices and structures (e.g. information stored in a IGES, DXF,Parasolid XT, JT, DRG, or any other suitable format for storing orrendering such mechanical design structures). Similar to designstructure 920, design structure 990 preferably comprises one or morefiles, data structures, or other computer-encoded data or instructionsthat reside on transmission or data storage media and that whenprocessed by an ECAD system generate a logically or otherwisefunctionally equivalent form of one or more of the embodiments of theinvention shown in FIGS. 1-39. In one embodiment, design structure 990may comprise a compiled, executable HDL simulation model thatfunctionally simulates the devices shown in FIGS. 1-39.

Design structure 990 may also employ a data format used for the exchangeof layout data of integrated circuits and/or symbolic data format (e.g.information stored in a GDSII (GDS2), GL1, OASIS, map files, or anyother suitable format for storing such design data structures). Designstructure 990 may comprise information such as, for example, symbolicdata, map files, test data files, design content files, manufacturingdata, layout parameters, wires, levels of metal, vias, shapes, data forrouting through the manufacturing line, and any other data required by amanufacturer or other designer/developer to produce a device orstructure as described above and shown in FIGS. 1-39. Design structure990 may then proceed to a stage 995 where, for example, design structure990: proceeds to tape-out, is released to manufacturing, is released toa mask house, is sent to another design house, is sent back to thecustomer, etc.

The method as described above is used in the fabrication of integratedcircuit chips. The resulting integrated circuit chips can be distributedby the fabricator in raw wafer form (that is, as a single wafer that hasmultiple unpackaged chips), as a bare die, or in a packaged form. In thelatter case the chip is mounted in a single chip package (such as aplastic carrier, with leads that are affixed to a motherboard or otherhigher level carrier) or in a multichip package (such as a ceramiccarrier that has either or both surface interconnections or buriedinterconnections). In any case the chip is then integrated with otherchips, discrete circuit elements, and/or other signal processing devicesas part of either (a) an intermediate product, such as a motherboard, or(b) an end product. The end product can be any product that includesintegrated circuit chips.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of the invention. Asused herein, the singular forms “a”, “an” and “the” are intended toinclude the plural forms as well, unless the context clearly indicatesotherwise. It will be further understood that the terms “comprises”and/or “comprising,” when used in this specification, specify thepresence of stated features, integers, steps, operations, elements,and/or components, but do not preclude the presence or addition of oneor more other features, integers, steps, operations, elements,components, and/or groups thereof.

The corresponding structures, materials, acts, and equivalents of allmeans or step plus function elements, if any, in the claims below areintended to include any structure, material, or act for performing thefunction in combination with other claimed elements as specificallyclaimed. The description of the present invention has been presented forpurposes of illustration and description, but is not intended to beexhaustive or limited to the invention in the form disclosed. Manymodifications and variations will be apparent to those of ordinary skillin the art without departing from the scope and spirit of the invention.The embodiments were chosen and described in order to best explain theprinciples of the invention and the practical application, and to enableothers of ordinary skill in the art to understand the invention forvarious embodiments with various modifications as are suited to theparticular use contemplated.

1. A method of manufacturing a dynamic random access memory cell,comprising: forming a substrate having an insulating region over aconductive region; forming a fin of a fin-type field effect transistor(FinFET) device over the insulating region; forming a storage capacitorat a first end of the fin; and forming a back-gate at a lateral side ofthe fin, wherein the back-gate is in electrical contact with theconductive region and is structured and arranged to influence athreshold voltage of the fin.
 2. The method of claim 1, wherein: theconductive region is formed over a doped region, the conductive regionis doped as a first type, and the doped region is doped as a second typeopposite the first type.
 3. The method of claim 1, wherein the storagecapacitor is formed in a trench formed in the substrate.
 4. The methodof claim 1, wherein the storage capacitor is formed in a trench formedabove the fin.
 5. A method of manufacturing a dynamic random accessmemory cell, comprising: forming a doped region within a substrate;forming a conductive layer over the doped region; forming an insulatinglayer over the conductive layer; forming a fin over the insulatingregion; forming a storage capacitor connected to a first end of the fin;forming a bit line contact connected to a second end of the fin oppositethe first end; forming a back-gate at a first lateral side of the finbetween the first end and the second end, wherein the back-gate is inelectrical contact with the conductive layer; and forming a front gateat a second lateral side of the fin opposite the first lateral side. 6.The method of claim 5, wherein the conductive layer and the doped regionare doped with opposite type dopants.
 7. The method of claim 5, whereinthe storage capacitor extends downward from the fin.
 8. The method ofclaim 7, wherein the storage capacitor comprises a filled trenchextending through the conductive layer and into the doped region.
 9. Themethod of claim 5, wherein the storage capacitor extends upward from thefin.
 10. The method of claim 9, wherein the storage capacitor comprisesa filled trench extending into a dielectric layer formed above the fin.11. The method of claim 5, wherein the front gate comprises a word line.12. The method of claim 5, wherein the conductive region is structuredand arranged to influence a threshold voltage of the fin between a firstthreshold voltage and a second threshold voltage.
 13. The method ofclaim 12, wherein: the first threshold voltage is a standby modevoltage, and the second threshold voltage is an access mode voltage. 14.A method of forming an array of dynamic random access memory cells,comprising: forming a plurality of fins over a conductive region of asubstrate; for each one of the plurality of fins, forming: a storagecapacitor connected to a first longitudinal end of the fin; a back-gateadjacent at a first lateral side of the fin, wherein the back-gate is inelectrical contact with the conductive region; and a front gate at asecond lateral side of the fin opposite the first lateral side.
 15. Themethod of claim 14, further comprising forming, for each one of theplurality of fins, a bit line contact at a second longitudinal end ofthe fin opposite the first longitudinal end.
 16. The method of claim 15,wherein the conductive region is structured and arranged to influence athreshold voltage in each one of the plurality of fins.
 17. The methodof claim 14, wherein the plurality of fins are interleaved.
 18. A methodof forming an array of dynamic random access memory cells, comprising:forming, in a substrate, a doped region having a first type of dopant;forming, in the substrate and over the doped region, a conductive regionhaving a second type of dopant opposite the first type of dopant;forming a plurality of fin-type field effect transistor (FinFET)devices, wherein each one of the plurality of FinFET devices comprises:a fin formed over the conductive region of a substrate; a storagecapacitor connected to a longitudinal end of the fin; a back-gateadjacent at a first lateral side of the fin, wherein the back-gate is inelectrical contact with the conductive region; and a front gate at asecond lateral side of the fin opposite the first lateral side.
 19. Themethod of claim 18, wherein the plurality of FinFET devices form aninterleaved array.
 20. The method of claim 18, wherein the conductiveregion is structured and arranged to influence a threshold voltage ineach one of the plurality of FinFET devices.